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Post-Clean Treatments
Post-Clean treatments are specifically formulated for use after post etch residue or photoresist removal and prior to the DI water rinse step. DuPont’s Post-Clean treatments are part of our EKC Technology portfolio.
Post-Clean treatment portfolio:
EKC4000™ PCT Post-Clean Treatment
EKC4000™ PCT is a cost effective replacement that outperforms conventional "rinse" chemistries such as IPA and NMP. It quickly and effectively eliminates corrosion on the wafer surface caused by drag-out (carry over) of chemistry from prior wet cleaning. EKC4000™ PCT is compatible with automatic equipment and is formulated to meet ULSI grade specifications for advanced wafer treatment.
Photoresist & Residue Removers
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Post-Clean Treatments
Post-Clean Treatments
Post-Clean treatments are specifically formulated for use after post etch residue or photoresist removal and prior to the DI water rinse step.
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Post-Etch Residue Removers
Post-Etch Residue Removers
Aqueous & semi-aqueous organic mixtures formulated to effectively remove residues from substrate surfaces after via, poly and metal etch processes.
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Removers for LED Fabrication
Removers for LED Fabrication
Enable removal of positive- and negative-tone photoresists as well as plasma-hardened residues, and which are compatible with a wide variety of metals required to form LED contacts
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Photoresist Removers
Photoresist Removers
Organic materials specifically formulated to remove positive & negative photoresist from substrate surfaces
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